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Séminaire David MUNOZ-ROJAS - 3 décembre 2018 à 14h30

par Christelle FLOUTIER -

Lundi 3 décembre 2008 à 14h30

Séminaire du Docteur David MUNOZ-ROJAS

 

Laboratoire des Matériaux et du Génie Physique (LMGP)

Université de Grenoble

 

Open-air processing of innovative transparent conductive materials with spatial ALD (SALD)

 

Abstract
Spatial Atomic Layer Deposition (SALD) is an alternative approach to ALD that is gaining momentum in the last years due to the high deposition rate that it offers. In combination with the unique properties of ALD, namely, film homogeneity, precise thickness control, high quality materials at low temperatures and unique ability to conformably coat high aspect ratio features, the high throughput offered by SALD widens the potential industrial applications of ALD.
Additionally, SALD can be performed at atmospheric pressure, and even in the open air. One approach to do so is to use a deposition manifold head in which the different precursors and inert gas flows are injected along parallel channels. By placing the substrate to be coated close enough to the deposition head, efficient precursor separation is achieved. Such close proximity approach is indeed very convenient to couple SALD with other deposition and processing methods, in order to fabricate functional devices. [1]
On type of materials that can benefit for the unique assets of SLAD are transparent conductive materials (TCMs). TCMs are currently widely used in different type of devices raging from solar cells or LEDs to touch screens or transparent heaters. Depending on the applications, the properties of TCMs in terms of conductivity, transparency and stability need to be tuned. But in most cases, the ability to deposit TCMs at low temperatures and with high throughput is required in order to be compatible with other delicate components in the device (organic active materials, soft substrates such as plastic) and to be convenient for industrial application (were high deposition rates are needed).
In this communication I will show several examples of application of open air SALD to the deposition and surface engineering of innovative TCMs. The effect of processing in the open air in the properties of the deposited films will also be discussed.
 
References
[1] D. Muñoz-Rojas, J. MacManus-Driscoll, Spatial atmospheric atomic layer deposition : a new laboratory and industrial tool for low-cost photovoltaics, Mater. Horizons. 1 (2014) 314–320. doi:10.1039/c3mh00136a.
CV :
Dr. David Muñoz-Rojas received his degree in organic chemistry in 1999 and master’s degree in chemical engineering (2000) from the Instituto Químico de Sarrià (IQS, Barcelona, Spain), obtaining the P. Salvador Gil, S.I. 2000 prize. He did his PhD in materials science (2004) at the Instituto de Ciencia de Materiales de Barcelona (CSIC-UAB). Thereafter, he worked as a postdoc at the Laboratoire de Réactivité et Chimie des Solides in Amiens (France), the Research Centre for Nanoscience and Nanotechnology in Barcelona, and the University of Cambridge (Device Materials Group, UK). Dr. Muñoz-Rojas is currently a permanent CNRS researcher at the Laboratoire des Matériaux et du Génie Physique in Grenoble, France. His research focuses on using and developing cheap and scalable chemical approaches for the fabrication of novel functional materials for electronic and optoelectronic applications. In particular, he has pioneered the development of the novel spatial atomic layer deposition (SALD) technique for the deposition of active components for optoelectronic devices. He is currently further developing SALD to extend the possibilities and fields of application of this exciting technique though several ANR (one as coordinator), regional and local projects and a FET Open project that he coordinates. He has published 59 publications and 3 patents.
https://sites.google.com/site/workdmr/

Agenda

  • Lundi 3 décembre 14:30-15:30 - David MUNOZ-ROJAS - Université de Grenoble

    Séminaire David MUNOZ-ROJAS - 3 décembre 2018 à 14h30

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